Epitaxial growth of (100)-oriented SmN directly on (100)Si substrates
نویسندگان
چکیده
We demonstrate growth of epitaxial (100)SmN thin films directly on (100)Si surfaces. By using physical vapor deposition Sm metal in an ${\mathrm{N}}_{2}$ atmosphere we show that careful control substrate temperature, pressure, and postannealing steps leads to SmN without the formation samarium silicide impurity phases. While rare-earth competes with is favored over nitride at high temperatures, find low-temperature grown seed layers are stable against high-temperature annealing, thus allow for subsequent a clear relationship Si substrate. The relatively low lattice mismatch (100)Si, compared other commonly available substrates, coupled cost maturity processing technology provide promising route further studies fundamental properties isostructural members series. Because ferromagnetic semiconductor, which also becomes superconducting close 4 K under sufficient doping, integration presents new opportunities spin-transport devices.
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ژورنال
عنوان ژورنال: Physical Review Materials
سال: 2021
ISSN: ['2476-0455', '2475-9953']
DOI: https://doi.org/10.1103/physrevmaterials.5.113404